- Suitable for OLED, PLED, high uniform film, semi-conductor, and refractory metal applications
- Pretreatment chamber dimensions: Ø500-800 x H300-450 mm
- Organic and metal chamber dimensions: Ø500-800 x H600-1000 mm
- Chamber material: 304 SS
- Chamber size: 2-10″
- Substrate running speed: 5-20rpm
- Substrate maximum temperature: 300° C
- Ultimate vacuum pressure: 1.3 x 10-5 Pa
- Organic Deposition Source: 4-8 sets; 600W
- Metal Deposition Source: 2-6 sets; 2000W-5000W
- Distance from source to substrate: 260-600 mm (adjustable)
